Description
DC magnetron Sputter, RF Diode Sputter, RF magnetron Sputter 1-4 of cathode. Perkin-Elmer 4400 Sputtering Deposition Equipment Delta Cathode Perkin-Elmer 4400 Sputtering Deposition Equipment Delta Cathode small sample to 6 inch wafer 1-2 gas lines with MFC RF Etch Bias function Loadlock heating function Chamber heating function (Occupy one cathode port). Co-Sputter function Reactive sputter functionConfiguration
No ConfigurationOEM Model Description
The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.Documents
No documents
Verified
CATEGORY
PVD / Sputtering
Last Verified: 20 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
138433
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PERKIN ELMER
4400
CATEGORY
PVD / Sputtering
Last Verified: 20 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
138433
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
DC magnetron Sputter, RF Diode Sputter, RF magnetron Sputter 1-4 of cathode. Perkin-Elmer 4400 Sputtering Deposition Equipment Delta Cathode Perkin-Elmer 4400 Sputtering Deposition Equipment Delta Cathode small sample to 6 inch wafer 1-2 gas lines with MFC RF Etch Bias function Loadlock heating function Chamber heating function (Occupy one cathode port). Co-Sputter function Reactive sputter functionConfiguration
No ConfigurationOEM Model Description
The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.Documents
No documents