Description
PC controller New PCBsConfiguration
No ConfigurationOEM Model Description
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/TiDocuments
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KDF / MRC
603
CATEGORY
PVD / Sputtering
Last Verified: 9 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
138420
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
PC controller New PCBsConfiguration
No ConfigurationOEM Model Description
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/TiDocuments
No documents