The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti

KDF / MRC 

Includes:  MDX Magnetron Power Supply, Advanced Energy Delta Power Supply

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Includes: MRC Materials Research Corp. 603 Sputtering System, Serial# 1017455, To Include: AE MDX Magnetron Drive, ENI Power Generator

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MRC 603 693 TES
MRC 693 Rebuilt as a TES-600 Fast Cycle Load Lock Sputtering System, Completely Rebuilt by TES (Technical Engineering Services), New Software and Planar Flat Screen Monitor, Advanced Energy Pinnacle II DC Power Supply, GE Fanuc System Automation COntrol Software and Hardware, Also includes RF Power Supply and Matching Network

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603

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