The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti

603 III

903M

Load-locks for high throughput and come with a choice of two (Axis II), three (Axis III) and four (Axis IV) target configurations.



903A

PLANAR

8800

643P

902M

Galaxy 1000 cluster tool, Flow-Enhanced CVD, W, TiN processes for integrated W plug formation (combined with adhesion layer PVD and aluminum PVD).

GALAXY 1000

903WLL

The MRC 693 is a sputtering system of the TES-600 Fast Cycle Load Lock variety that has undergone a complete rebuild by Technical Engineering Services (TES). It boasts updated software, a flat screen monitor from Planar, a Pinnacle II DC Power Supply from Advanced Energy, and control software and hardware from GE Fanuc System Automation. Additionally, it comes equipped with an RF Power Supply and a Matching Network.

MRC

Overview

Active Listings

Total Products

Services

Top MRC PVD / Sputtering

643

603

902

822

List it with Moov and find the perfect buyer in no time at all.

All MRC PVD / Sputtering