The WJ-1000H Hydride system deposits doped or undoped silicon dioxide (SiO2) films, created from the Silane/Oxygen CVD reaction. It is capable of processing 100-mm to 200-mm wafers and has demonstrated high productivity and reliability. The system is designed for process flexibility and produces consistent film properties over the entire wafer surface. It has a low cost of ownership due to its MonoBlok™ Linear injector and high throughput.
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