Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The WJ-1000H Hydride system deposits doped or undoped silicon dioxide (SiO2) films, created from the Silane/Oxygen CVD reaction. It is capable of processing 100-mm to 200-mm wafers and has demonstrated high productivity and reliability. The system is designed for process flexibility and produces consistent film properties over the entire wafer surface. It has a low cost of ownership due to its MonoBlok™ Linear injector and high throughput.Documents
No documents
AVIZA / WATKINS-JOHNSON
WJ 1000H
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
63313
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AVIZA / WATKINS-JOHNSON
WJ 1000H
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
63313
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The WJ-1000H Hydride system deposits doped or undoped silicon dioxide (SiO2) films, created from the Silane/Oxygen CVD reaction. It is capable of processing 100-mm to 200-mm wafers and has demonstrated high productivity and reliability. The system is designed for process flexibility and produces consistent film properties over the entire wafer surface. It has a low cost of ownership due to its MonoBlok™ Linear injector and high throughput.Documents
No documents