The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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- P5000 CVDCVDVintage: 1996Condition: UsedLast VerifiedYesterday
- P5000 CVDCVDVintage: 1996Condition: UsedLast Verified5 days ago
- P5000 CVDCVDVintage: 2000Condition: UsedLast Verified5 days ago
- P5000 CVDCVDVintage: 1993Condition: UsedLast Verified5 days ago