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TEL / TOKYO ELECTRON UNITY IIE
    Description
    TEL Unity2e-855DPA
    Configuration
    No Configuration
    OEM Model Description
    The UNITY® IIe is a platform designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY®, which also includes the M and Me platforms, each designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is available in 84, 85 and 88 models. The UNITY® IIe boasts high throughput, a compact design, lower CoO, and ease of maintenance.
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    TEL / TOKYO ELECTRON

    UNITY IIE

    verified-listing-icon

    Verified

    CATEGORY

    Plasma Etch
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    98741


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown

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    TEL / TOKYO ELECTRON UNITY IIE
    TEL / TOKYO ELECTRONUNITY IIEPlasma Etch
    Vintage: 0Condition: Used
    Last Verified4 days ago

    TEL / TOKYO ELECTRON

    UNITY IIE

    verified-listing-icon

    Verified

    CATEGORY

    Plasma Etch
    Last Verified: Over 60 days ago
    listing-photo-6704c3eb92594a01baab6d2bad8a2505-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    98741


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    TEL Unity2e-855DPA
    Configuration
    No Configuration
    OEM Model Description
    The UNITY® IIe is a platform designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY®, which also includes the M and Me platforms, each designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is available in 84, 85 and 88 models. The UNITY® IIe boasts high throughput, a compact design, lower CoO, and ease of maintenance.
    Documents

    No documents

    Similar Listings
    View All
    TEL / TOKYO ELECTRON UNITY IIE
    TEL / TOKYO ELECTRON
    UNITY IIE
    Plasma EtchVintage: 0Condition: UsedLast Verified: 4 days ago
    TEL / TOKYO ELECTRON UNITY IIE
    TEL / TOKYO ELECTRON
    UNITY IIE
    Plasma EtchVintage: 0Condition: UsedLast Verified: 4 days ago
    TEL / TOKYO ELECTRON UNITY IIE
    TEL / TOKYO ELECTRON
    UNITY IIE
    Plasma EtchVintage: 0Condition: UsedLast Verified: 4 days ago