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TEL / TOKYO ELECTRON UNITY EP
    Description
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    OEM Model Description
    The UNITY®-EP CVD system is a state-of-the-art tool for high volume manufacturing of integrated circuits. It is based on the field-proven UNITY CVD process and offers productivity enhancements for CVD metal films. The system is designed to be space-efficient and easy to maintain, with improved process stability through the use of an upgraded heater temperature control (PCOT). The system can handle wafer sizes of 150mm and 200mm, with 1 to 4 process modules and 1 or 2 cooling modules. It can perform pre-clean, Ti, TiN processes and features plasma-free cleaning. This makes it a versatile and reliable tool for the semiconductor industry.
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    TEL / TOKYO ELECTRON

    UNITY EP

    verified-listing-icon

    Verified

    CATEGORY

    Plasma Etch
    Last Verified: Over 60 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    98566

    Wafer Sizes:

    8"/200mm

    Vintage:

    Unknown

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    TEL / TOKYO ELECTRON UNITY EP
    TEL / TOKYO ELECTRONUNITY EPPlasma Etch
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    TEL / TOKYO ELECTRON

    UNITY EP

    verified-listing-icon

    Verified

    CATEGORY

    Plasma Etch
    Last Verified: Over 60 days ago
    listing-photo-7515b1db7c68478fb62e291ef54c846d-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    98566

    Wafer Sizes:

    8"/200mm

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The UNITY®-EP CVD system is a state-of-the-art tool for high volume manufacturing of integrated circuits. It is based on the field-proven UNITY CVD process and offers productivity enhancements for CVD metal films. The system is designed to be space-efficient and easy to maintain, with improved process stability through the use of an upgraded heater temperature control (PCOT). The system can handle wafer sizes of 150mm and 200mm, with 1 to 4 process modules and 1 or 2 cooling modules. It can perform pre-clean, Ti, TiN processes and features plasma-free cleaning. This makes it a versatile and reliable tool for the semiconductor industry.
    Documents

    No documents

    Similar Listings
    View All
    TEL / TOKYO ELECTRON UNITY EP
    TEL / TOKYO ELECTRON
    UNITY EP
    Plasma EtchVintage: 0Condition: UsedLast Verified: Over 60 days ago