![NIKON FX-601F](https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/3590/5d7058f368854f968808ea605688c4e8/5b073454a00749be944526a6a9729842_e26b17c7c83e4dcb828afddde052dbb6_lw.jpeg)
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)Documents
No documents
NIKON
FX-601F
Verified
CATEGORY
Photolithography
Last Verified: 28 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
67595
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllNIKON
FX-601F
CATEGORY
Photolithography
Last Verified: 28 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
67595
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)Documents
No documents