Axcelis acquired Fusion Systems Corporation in August 1997.
Fusion is a leading worldwide supplier of single-wafer ashers and photostabilizers used in the fabrication of advanced semi- conductor devices.

AXCELIS / FUSION

200 ACU 

The UltraStep 1500 is a big field 1:1 projection stepper system that exposes reticle images onto wafers of various sizes in a step-and-repeat manner. It has a fine line resolution of 1.0um standard and 0.8um optional, and tight overlay accuracy. The UltraStep 1500 features a larger exposure field, an electronic focus system, electronic target detectors, 944 servo boards, and a cast illuminator with upgraded optics. These features allow for large die exposure, increased throughput, more accurate and repeatable substrate positioning, simultaneous independent target scans, more stability during movement and exposure, and lower exposure field uniformity. The UltraStep 1500’s low cost and compact design make it an ideal choice for chipmakers upgrading from older equipment, and it can be integrated with other higher resolution steppers to maximize throughput while minimizing production costs.

Veeco Instruments Inc. a global leader of advanced thin film etch and deposition process equipment, acquired Ultratech, Inc. a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and LEDs.


VEECO / ULTRATECH

1500

200 MCU

The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities. 

Photolithography

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200 ACU

1500

200 MCU

SATURN SPECTRUM 3e