Utility Configuration: Main Equipment, Chiller (Gray), Anti-Static Device (White)
-Actual Status of Equipment/Parts
-Equipment: Not operational. Out of three chambers, two are broken. Automation not functional. Major parts need -replacement.
-Transfer robot is broken.
-Load Lock module initialization fails.
-System software failure.

Chiller: Requires repair.

Anti-Static Device: Functional.

Disposition or Usable Parts
For Sale: Main equipment, chiller, anti-static device, monitor shelf.
Exclusions from Sale: Pump, monitor, keyboard, chair.

Plasma-Therm is a global manufacturer of plasma etch, deposition, and advanced packaging equipment for the specialty semiconductor and nanotechnology markets.

PLASMATHERM

Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications.

The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system.

Hardware:
-Cassette-to-Cassette Handling:
     - Multi-substrate batch processing
-Dual cassettes
-Platen heating up to 350°C
-Upper electrode RF power at 13.56 MHz with optional MFD
-Up to 8 gas channels with digital MFCs
-Thermally managed reactor design—up to 175°C for internal walls and shower head

PLASMATHERM

LAPECVD

PECVD

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