Description

3 main modules (Left Chamber, Right Chamber and LoadLock) + Accessories (3 Mechanical Oil Pumps, and one Chiller, Computer and accessories)

Configuration

Details Attached

OEM Model Description

The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces

Documents

plasmalab_100.pdf

OXFORD

PLASMALAB 100

Verified

PECVD

Last Verified: Over 30 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

136084

Wafer Sizes:

Unknown

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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