Description
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1. Process module (ICP-RIE Etch, PECVD) . Process Chamber Inside 2. Loadlock (outside & Inside) 3. Gas Supply (ICP-RIE Etch, PECVD) -Gas Supply (for ICP-RIE Etch) ✓ HBr 50sccm ✓ BCl3 50sccm ✓ Cl2 50sccm ✓ SF6 100sccm ✓ Ar 100sccm ✓ O2 100sccm -Gas Supply (for PECVD) ✓ 5%SiH4/N2 1000sccm ✓ NH3 50sccm ✓ N2O 2000sccm ✓ N2 2000sccm ✓ O2 200sccm ✓ CF4 500sccm 4. Chiller 5. Power Transfer 6. PC * Pump : not includedOEM Model Description
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CATEGORY
Dry / Plasma Etch
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
103544
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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OXFORD
PLASMALAB 100 DRY / PLASMA ETCH
CATEGORY
Dry / Plasma Etch
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
103544
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available