Description
Advanced PECVD System for Thin Film Deposition & Etch Applications Oxford Instruments Plasmalab System 100 Comdel LF Generator Upgrade - First Solar part number 94-219969U1 PC2003 RF Generator Interface Architecture Multiple RF Channels for Independent Process Control Integrated Power Distribution & Matching Network Reliable Oxford Instruments Technology Built for Demanding Environments The Oxford Plasmalab System 100 is a versatile PECVD platform designed for a wide range of deposition and etch applications. This system has been upgraded with a Comdel LF Generator, optimized for First Solar process requirements. It features a robust RF architecture with PC2003 interfaces and modular power distribution, providing precise control and repeatability for advanced thin film processes.Configuration
Part Number - 94.219969U1 RF Interface - PC2003 Series RF Channels - Multiple Power Distribution - 100 Plus Power Box Applications - PECVD Deposition / EtchOEM Model Description
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small piecesDocuments
Verified
CATEGORY
PECVD
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
150611
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
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Refurbishment Services
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OXFORD
PLASMALAB 100 PECVD
CATEGORY
PECVD
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
150611
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available