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LAM RESEARCH / NOVELLUS VECTOR EXPRESS
    Description
    No description
    Configuration
    -Software version: 6.07B93_2.30B36 CIM: E84, SECS/GEM, GEM300, Interface A Process: TFM_Ashable HM Amorphous Carbon -Hardware Configuration (Fab): Main System: Vector Express AHMxT System- 1 Handler System: FOUP RF ID Reader- 2 Factory Interface: FOUP- 3 Options System: EBR Capable Loadlock- 1 Options System: First in FAB Kit Vector Express AHMxT- 1 Options System: Secondary Isolation Kit- 1 Options System: High Temperature Process Kit- 1 Options System: Heated Process Manometer- 1 Options System: Ionizer Kit- 1
    OEM Model Description
    Novellus VECTOR Express is an improvement to Novellus’ 300 mm VECTOR plasma-enhanced chemical vapor deposition (PECVD) platform that was introduced in 2007. It maintains industry-leading capital and footprint productivity by improving process throughput by up to 40%, while delivering benchmark thin film process performance that is critical to tool extendibility to 45 nm and beyond. The SmartSoak processing feature is incorporated in VECTOR Express which utilizes the multi-station sequential processing (MSSP) architecture of VECTOR to control wafer heat-up independently from film deposition, improving film quality and reducing processing time . VECTOR Express is also available in an ashable hard mask configuration (VECTOR Express AHM), designed to deposit films for the high aspect ratio patterning requirements required by 193 nm lithography.
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    LAM RESEARCH / NOVELLUS

    VECTOR EXPRESS

    verified-listing-icon

    Verified

    CATEGORY

    PECVD
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    54601


    Wafer Sizes:

    12"/300mm


    Vintage:

    2011

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    LAM RESEARCH / NOVELLUS VECTOR EXPRESS
    LAM RESEARCH / NOVELLUSVECTOR EXPRESSPECVD
    Vintage: 0Condition: Used
    Last Verified15 days ago

    LAM RESEARCH / NOVELLUS

    VECTOR EXPRESS

    verified-listing-icon

    Verified

    CATEGORY

    PECVD
    Last Verified: Over 60 days ago
    listing-photo-b9dbfd2b8af54c16b03d0d1b8ae9f62f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1705/b9dbfd2b8af54c16b03d0d1b8ae9f62f/7b99d76821e348bea85a0314b24e316e_3fbf45fb645d4dde92beb1855ff242b71201a_mw.jpeg
    listing-photo-b9dbfd2b8af54c16b03d0d1b8ae9f62f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1705/b9dbfd2b8af54c16b03d0d1b8ae9f62f/9b5169d11687485eb5a5612a5399f35d_d2822b74d3ba4f3682c0310d57cb54571201a_mw.jpeg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    54601


    Wafer Sizes:

    12"/300mm


    Vintage:

    2011


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    -Software version: 6.07B93_2.30B36 CIM: E84, SECS/GEM, GEM300, Interface A Process: TFM_Ashable HM Amorphous Carbon -Hardware Configuration (Fab): Main System: Vector Express AHMxT System- 1 Handler System: FOUP RF ID Reader- 2 Factory Interface: FOUP- 3 Options System: EBR Capable Loadlock- 1 Options System: First in FAB Kit Vector Express AHMxT- 1 Options System: Secondary Isolation Kit- 1 Options System: High Temperature Process Kit- 1 Options System: Heated Process Manometer- 1 Options System: Ionizer Kit- 1
    OEM Model Description
    Novellus VECTOR Express is an improvement to Novellus’ 300 mm VECTOR plasma-enhanced chemical vapor deposition (PECVD) platform that was introduced in 2007. It maintains industry-leading capital and footprint productivity by improving process throughput by up to 40%, while delivering benchmark thin film process performance that is critical to tool extendibility to 45 nm and beyond. The SmartSoak processing feature is incorporated in VECTOR Express which utilizes the multi-station sequential processing (MSSP) architecture of VECTOR to control wafer heat-up independently from film deposition, improving film quality and reducing processing time . VECTOR Express is also available in an ashable hard mask configuration (VECTOR Express AHM), designed to deposit films for the high aspect ratio patterning requirements required by 193 nm lithography.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS VECTOR EXPRESS
    LAM RESEARCH / NOVELLUS
    VECTOR EXPRESS
    PECVDVintage: 0Condition: UsedLast Verified: 15 days ago
    LAM RESEARCH / NOVELLUS VECTOR EXPRESS
    LAM RESEARCH / NOVELLUS
    VECTOR EXPRESS
    PECVDVintage: 0Condition: UsedLast Verified: 22 days ago
    LAM RESEARCH / NOVELLUS VECTOR EXPRESS
    LAM RESEARCH / NOVELLUS
    VECTOR EXPRESS
    PECVDVintage: 2011Condition: UsedLast Verified: Over 60 days ago