Description
No: dry pump, RF rack, pump rackConfiguration
Novellus Concept Two Altus W-CVD - Dual Altus, Non Shrink - Nitride - Load Type: SMIF, LPI2200 - Process Module Type: CVDW - Chamber Position: B(3), C(4) Transfer Module Configuration - DLCM Type: DLCM-S - Cssette Interface: Platform - Robot Type: MAG7 - Arm Set: Dual Arm - Cool Station: 3 Level - Pressure Guage: MKS 100Torr - Throttle Valve: MOV 015 - Throttle Valve Controller: ACX32101 Chamber Configuration: - Chamber B CVD: C2-CVD-WS - Chamber C CVD: C2-CVD-WS - Pedestal: 200mm - Throttle Valve: MDVX-100B - Isolation Valve: 14040-PE44-AAL2 - RF Matcher: Trazer, AMU2-1 - RF Generator: AE, RFG 3000OEM Model Description
Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.Documents
No documents
LAM RESEARCH / NOVELLUS
CONCEPT TWO "C2" ALTUS
Verified
CATEGORY
MOCVD
Last Verified: 25 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
102817
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllLAM RESEARCH / NOVELLUS
CONCEPT TWO "C2" ALTUS
CATEGORY
MOCVD
Last Verified: 25 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
102817
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No: dry pump, RF rack, pump rackConfiguration
Novellus Concept Two Altus W-CVD - Dual Altus, Non Shrink - Nitride - Load Type: SMIF, LPI2200 - Process Module Type: CVDW - Chamber Position: B(3), C(4) Transfer Module Configuration - DLCM Type: DLCM-S - Cssette Interface: Platform - Robot Type: MAG7 - Arm Set: Dual Arm - Cool Station: 3 Level - Pressure Guage: MKS 100Torr - Throttle Valve: MOV 015 - Throttle Valve Controller: ACX32101 Chamber Configuration: - Chamber B CVD: C2-CVD-WS - Chamber C CVD: C2-CVD-WS - Pedestal: 200mm - Throttle Valve: MDVX-100B - Isolation Valve: 14040-PE44-AAL2 - RF Matcher: Trazer, AMU2-1 - RF Generator: AE, RFG 3000OEM Model Description
Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.Documents
No documents