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LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS
    Description
    No description
    Configuration
    LAM/Novellus C2-DLCM-S
    OEM Model Description
    Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.
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    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" ALTUS

    verified-listing-icon

    Verified

    CATEGORY
    CVD

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    115177


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" ALTUS

    CVD
    Vintage: 0Condition: Refurbished
    Last Verified10 days ago

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" ALTUS

    verified-listing-icon
    Verified
    CATEGORY
    CVD
    Last Verified: Over 60 days ago
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    115177


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    LAM/Novellus C2-DLCM-S
    OEM Model Description
    Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" ALTUS

    CVDVintage: 0Condition: RefurbishedLast Verified:10 days ago
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" ALTUS

    CVDVintage: 0Condition: UsedLast Verified:Over 60 days ago
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" ALTUS

    CVDVintage: 0Condition: UsedLast Verified:Over 60 days ago