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LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS
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    Novellus Concept Two Altus CVD
    OEM Model Description
    Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.
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    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" ALTUS

    verified-listing-icon

    Verified

    CATEGORY

    MOCVD
    Last Verified: Over 30 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    96260


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS
    LAM RESEARCH / NOVELLUSCONCEPT TWO "C2" ALTUSMOCVD
    Vintage: 0Condition: Parts Tool
    Last VerifiedOver 60 days ago

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" ALTUS

    verified-listing-icon

    Verified

    CATEGORY

    MOCVD
    Last Verified: Over 30 days ago
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    96260


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Novellus Concept Two Altus CVD
    OEM Model Description
    Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.
    Documents

    No documents

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    View All
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS
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