Description
-Installed and running -Equipment status: Operational. This machine GaN process. It can be used for both 4-inch and 6-inch wafers (previously used for 4-inch and now producing 6-inch). Only additional purchases of replacement hot plates and related accessories are required. Parts details attachedConfiguration
-Previously, the GaN growth was on 4-inch wafers, now it's on 6-inch wafers, all in six pieces. -Schematic and circuit data for the equipment. -Equipment: Photos of the reaction chamber (upper, inside, and below), and gas source piping with equipment door open. -Human-machine interface software version: EpiTT_TWO. -PLC, SLC, and RF generator details.OEM Model Description
The AIXTRON AIX 2800 G4 HT (High-Temperature) is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. It is designed specifically for high-temperature processing and the epitaxial growth of compound semiconductor materials.Documents
Verified
CATEGORY
MOCVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
104853
Wafer Sizes:
4"/100mm, 6"/150mm
Vintage:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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AIXTRON
AIX 2800 G4 HT
CATEGORY
MOCVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
104853
Wafer Sizes:
4"/100mm, 6"/150mm
Vintage:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available