The AIXTRON AIX 2800 G4 HT (High-Temperature) is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. It is designed specifically for high-temperature processing and the epitaxial growth of compound semiconductor materials.

The AIXTRON Group provides deposition equipment to the semiconductor industry. They are used for a wide range of manufacturing high-performance components for electronic and optoelectronic applications based on compound or organic semiconductor materials. These components are used in a variety of innovative applications, technologies and industries. These include, for example, LED and display technology, data transmission, sensor technology, energy management and conversion, communication, signal and lighting technology, and many other sophisticated high-tech applications.

AIXTRON

AIX 2800 G4 HT

Aixtron MOCVD G4 HT .pdf

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-Installed and running 
-Equipment status: Operational.

This machine GaN process. It can be used for both 4-inch and 6-inch wafers (previously used for 4-inch and now producing 6-inch). Only additional purchases of replacement hot plates and related accessories are required.

Parts details attached


parts list_Aixtron G4 .xlsx

AIX 2800G4 HT 2.pdf

AIX 2800G4 HT 1 .pdf

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AIXTRON AIX 2800 G4 HT 1.pdf

AIXTRON AIX 2800 G4 HT 2.pdf

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AIX 2800 G4 HT

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