Description
S200ETCH FILM THICKNESS MEASUREMENTConfiguration
No ConfigurationOEM Model Description
The S200 is a metrology system designed by Rudolph to meet the challenges of high-yield semiconductor production at 0.18μm and below. It offers the industry’s highest repeatability laser-ellipsometer and a High Repeatability Mode (HRM™) for next-generation gates. The system has a 5x10μm measurement spot, the smallest in the industry, allowing for accurate measurements in test structures three times smaller than those required by other systems. Its unique simultaneous multiple angle of incidence ellipsometry provides accurate measurements, resulting in powerful multi-layer film characterization and superior process control. The S200 also has a high wafer-per-hour throughput, nearly twice that of competing ellipsometers, and long 20-30,000 hour laser lifetimes provide unparalleled system-to-system matching, superior repeatability, and significantly lower maintenance.Documents
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ONTO / RUDOLPH / AUGUST
S200
Verified
CATEGORY
Metrology
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
78357
Wafer Sizes:
8"/200mm
Vintage:
2000
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / RUDOLPH / AUGUST
S200
Verified
CATEGORY
Metrology
Last Verified: 23 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
78357
Wafer Sizes:
8"/200mm
Vintage:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
S200ETCH FILM THICKNESS MEASUREMENTConfiguration
No ConfigurationOEM Model Description
The S200 is a metrology system designed by Rudolph to meet the challenges of high-yield semiconductor production at 0.18μm and below. It offers the industry’s highest repeatability laser-ellipsometer and a High Repeatability Mode (HRM™) for next-generation gates. The system has a 5x10μm measurement spot, the smallest in the industry, allowing for accurate measurements in test structures three times smaller than those required by other systems. Its unique simultaneous multiple angle of incidence ellipsometry provides accurate measurements, resulting in powerful multi-layer film characterization and superior process control. The S200 also has a high wafer-per-hour throughput, nearly twice that of competing ellipsometers, and long 20-30,000 hour laser lifetimes provide unparalleled system-to-system matching, superior repeatability, and significantly lower maintenance.Documents
No documents