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KLA ARCHER 300
    Description
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    OEM Model Description
    The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.
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    KLA

    ARCHER 300

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    Verified

    CATEGORY
    Metrology

    Last Verified: 20 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    97942


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    KLA ARCHER 300

    KLA

    ARCHER 300

    Metrology
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    KLA

    ARCHER 300

    verified-listing-icon
    Verified
    CATEGORY
    Metrology
    Last Verified: 20 days ago
    listing-photo-c71686661ae041b9a0016198412d076c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    97942


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    OL Matching Inspection
    Configuration
    OL Mating Test
    OEM Model Description
    The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.
    Documents

    No documents

    Similar Listings
    View All
    KLA ARCHER 300

    KLA

    ARCHER 300

    MetrologyVintage: 0Condition: UsedLast Verified: Over 60 days ago
    KLA ARCHER 300

    KLA

    ARCHER 300

    MetrologyVintage: 0Condition: UsedLast Verified: Over 60 days ago
    KLA ARCHER 300

    KLA

    ARCHER 300

    MetrologyVintage: 0Condition: UsedLast Verified: Over 60 days ago