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KLA ARCHER 300
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    OEM Model Description
    The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.
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    KLA

    ARCHER 300

    verified-listing-icon

    Verified

    CATEGORY

    Metrology
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    39130


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown

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    KLA ARCHER 300
    KLAARCHER 300Metrology
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    KLA

    ARCHER 300

    verified-listing-icon

    Verified

    CATEGORY

    Metrology
    Last Verified: Over 60 days ago
    listing-photo-5cc7da421db34befa1b69c5882f106c4-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    39130


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.
    Documents

    No documents

    Similar Listings
    View All
    KLA ARCHER 300
    KLA
    ARCHER 300
    MetrologyVintage: 0Condition: UsedLast Verified: Over 60 days ago
    KLA ARCHER 300
    KLA
    ARCHER 300
    MetrologyVintage: 0Condition: UsedLast Verified: Over 60 days ago
    KLA ARCHER 300
    KLA
    ARCHER 300
    MetrologyVintage: 0Condition: UsedLast Verified: Over 60 days ago