Description
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The Varian 350D is a medium current ion implanter that is capable of implanting Boron (B11 or BF2) or Phosphorous (P31) in 4” or 6” wafers with doses of 1E12 to 5E15. Implant energy levels can be adjusted from 10KeV and 200 KeV1. It is set up for 100mm and 150mm round substrates. It has applications in power devices, memory, logic, analog, discrete and MEMS.Documents
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APPLIED MATERIALS (AMAT) / VARIAN
350D
Verified
CATEGORY
Medium Current
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
82485
Wafer Sizes:
6"/150mm
Vintage:
Unknown
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APPLIED MATERIALS (AMAT) / VARIAN
350D
CATEGORY
Medium Current
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
82485
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The Varian 350D is a medium current ion implanter that is capable of implanting Boron (B11 or BF2) or Phosphorous (P31) in 4” or 6” wafers with doses of 1E12 to 5E15. Implant energy levels can be adjusted from 10KeV and 200 KeV1. It is set up for 100mm and 150mm round substrates. It has applications in power devices, memory, logic, analog, discrete and MEMS.Documents
No documents