Description
No descriptionConfiguration
-Precision High Performance Mask Alignment and Exposure System -Version: 75 MM -System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Hard or soft contact modes. -High precision alignment stage X,Y, Theta. -Microscope consists of normal field microscope with objective turret for different magnafications. 365 to 400nm spectral range up to 350W. 110V, 60 Hz.OEM Model Description
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."Documents
No documents
SUSS MicroTec / KARL SUSS
MJB3
Verified
CATEGORY
Mask/Bond Aligners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
62965
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
SUSS MicroTec / KARL SUSS
MJB3
CATEGORY
Mask/Bond Aligners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
62965
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
-Precision High Performance Mask Alignment and Exposure System -Version: 75 MM -System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Hard or soft contact modes. -High precision alignment stage X,Y, Theta. -Microscope consists of normal field microscope with objective turret for different magnafications. 365 to 400nm spectral range up to 350W. 110V, 60 Hz.OEM Model Description
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."Documents
No documents