
Description
Mask aligner Suss MJB 3 HP 350 W High pressure systemConfiguration
Accuracy (resolution): 0.5 µm 350W Lamphouse incl. UV 300/400 Exposure Optics Lamp Power Supply CIC 500 Exposure Timer Single field Microscope with Turret of 3 Objectives Binocular Tube with 2 Oculars X,Y, Theta Alignment Stage Fine adjustment with Micrometer Screws Chuck up to 3“ Wafer and Maskholder for up to 4“ Mask Pneumatic BoxOEM Model Description
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."Documents
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Verified
CATEGORY
Mask/Bond Aligners
Last Verified: 19 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
145110
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllSUSS MicroTec / KARL SUSS
MJB3
CATEGORY
Mask/Bond Aligners
Last Verified: 19 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
145110
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Mask aligner Suss MJB 3 HP 350 W High pressure systemConfiguration
Accuracy (resolution): 0.5 µm 350W Lamphouse incl. UV 300/400 Exposure Optics Lamp Power Supply CIC 500 Exposure Timer Single field Microscope with Turret of 3 Objectives Binocular Tube with 2 Oculars X,Y, Theta Alignment Stage Fine adjustment with Micrometer Screws Chuck up to 3“ Wafer and Maskholder for up to 4“ Mask Pneumatic BoxOEM Model Description
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."Documents
No documents