Description
i-Line ScannerConfiguration
No ConfigurationOEM Model Description
The TWINSCAN XT:400G 365-nm Step-and-Scan system is an ultra high-productivity, dual-stage lithography tool designed for volume 300-mm wafer production at 350-nm resolution. The dual wafer-stage technology of the TWINSCAN platform enables the exposure of one wafer and the alignment and mapping of the next wafer to take place in parallel, thereby virtually eliminating overhead time and allowing for continuous patterning of wafers.Documents
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ASML
TWINSCAN XT:400G
Verified
CATEGORY
I-Line
Last Verified: 8 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
91663
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:400G
CATEGORY
I-Line
Last Verified: 8 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
91663
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
i-Line ScannerConfiguration
No ConfigurationOEM Model Description
The TWINSCAN XT:400G 365-nm Step-and-Scan system is an ultra high-productivity, dual-stage lithography tool designed for volume 300-mm wafer production at 350-nm resolution. The dual wafer-stage technology of the TWINSCAN platform enables the exposure of one wafer and the alignment and mapping of the next wafer to take place in parallel, thereby virtually eliminating overhead time and allowing for continuous patterning of wafers.Documents
No documents