Description
HE-Ion Implanter Comes with pumps and chillersConfiguration
-High energy batch implant tool, 200mm capability -Energy range 10 – 3750keV -10-site-disk → 10 wafers per batch @200mm wafer diameter, automatic handling system, -Fully automated gas box → 4 gas modules •Argon (factory inlet), •PH3 SDS® •AsH3 SDS® •BF3 SDS® -On-Board-Argon option installed (semi automated filling of stripper reservoirs), -SECS/GEM Factory automation available, Software version 6.41OEM Model Description
None ProvidedDocuments
APPLIED MATERIALS (AMAT) / VARIAN
KESTREL
Verified
CATEGORY
High Current
Last Verified: 16 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
111719
Wafer Sizes:
Unknown
Vintage:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
KESTREL
CATEGORY
High Current
Last Verified: 16 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
111719
Wafer Sizes:
Unknown
Vintage:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available