Description
Working, no missing parts.Configuration
Process AP H2 Alloy N2 Purge System YesOEM Model Description
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.Documents
TEL / TOKYO ELECTRON
ALPHA-8SE
Verified
CATEGORY
Furnaces / Diffusion
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
98808
Wafer Sizes:
8"/200mm
Vintage:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
ALPHA-8SE
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
98808
Wafer Sizes:
8"/200mm
Vintage:
2003
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Working, no missing parts.Configuration
Process AP H2 Alloy N2 Purge System YesOEM Model Description
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.Documents
Similar Listings
View AllTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 2005Condition: UsedLast Verified: 15 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 30 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 2000Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 2003Condition: UsedLast Verified: 4 days agoTEL / TOKYO ELECTRON