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TEL / TOKYO ELECTRON ALPHA-8SE
    Description
    Working, no missing parts.
    Configuration
    Process AP H2 Alloy N2 Purge System Yes
    OEM Model Description
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    Documents

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    98808


    Wafer Sizes:

    8"/200mm


    Vintage:

    2003


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    Vintage: 2007Condition: Used
    Last Verified15 days ago

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: Over 60 days ago
    listing-photo-b91f893366ff4df7a1524e20f09c3df2-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/55031/b91f893366ff4df7a1524e20f09c3df2/bbe439a0860e46f4932a002415cd4f7c_7860telalpha8seh2alloyconfigpage1image0004_mw.jpg
    listing-photo-b91f893366ff4df7a1524e20f09c3df2-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/55031/b91f893366ff4df7a1524e20f09c3df2/97ffc64dd8e94767b15664ec67c1f0e2_7860telalpha8seh2alloyconfigpage1image0002_mw.jpg
    listing-photo-b91f893366ff4df7a1524e20f09c3df2-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/55031/b91f893366ff4df7a1524e20f09c3df2/52e87b7156a845739810854be2c014c5_7860telalpha8seh2alloyconfigpage1image0007_mw.jpg
    listing-photo-b91f893366ff4df7a1524e20f09c3df2-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/55031/b91f893366ff4df7a1524e20f09c3df2/0d4e7a8b80e8493ea76218bfcace6044_7860telalpha8seh2alloyconfigpage1image0005_mw.jpg
    listing-photo-b91f893366ff4df7a1524e20f09c3df2-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/55031/b91f893366ff4df7a1524e20f09c3df2/740b2ad904204d6cbd12eba81dae051c_7860telalpha8seh2alloyconfigpage1image0003_mw.jpg
    listing-photo-b91f893366ff4df7a1524e20f09c3df2-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/55031/b91f893366ff4df7a1524e20f09c3df2/4ca2adb821ec40059987b5b60941e821_7860telalpha8seh2alloyconfigpage1image0006_mw.jpg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    98808


    Wafer Sizes:

    8"/200mm


    Vintage:

    2003


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Working, no missing parts.
    Configuration
    Process AP H2 Alloy N2 Purge System Yes
    OEM Model Description
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    Documents
    Similar Listings
    View All
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / DiffusionVintage: 2007Condition: UsedLast Verified:15 days ago
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / DiffusionVintage: 2000Condition: UsedLast Verified:10 days ago
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / DiffusionVintage: 2003Condition: UsedLast Verified:Over 30 days ago