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KOKUSAI-ELECTRIC (KE) DJ 833V
    Description
    MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX2000 Equipment status: Out of Fab Process: POLY-Si Type: Diffusion Air valve: FUJIKIN Heater: D4EX05537 MFC, MFM: STEC Three phase power: 3Ø AC 200V Single phase power: 1Ø AC 100V Gas: N2 / SiH4 / Si2H6
    Configuration
    Process: POLY-Si The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )
    OEM Model Description
    "VERTRON-III(G) Model Numbers:DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."
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    No documents

    KOKUSAI-ELECTRIC (KE)

    DJ 833V

    verified-listing-icon

    Verified

    CATEGORY

    Furnaces / Diffusion
    Last Verified: 5 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    72842


    Wafer Sizes:

    12"/300mm


    Vintage:

    2008

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    KOKUSAI-ELECTRIC (KE)

    DJ 833V

    verified-listing-icon

    Verified

    CATEGORY

    Furnaces / Diffusion
    Last Verified: 5 days ago
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    72842


    Wafer Sizes:

    12"/300mm


    Vintage:

    2008


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX2000 Equipment status: Out of Fab Process: POLY-Si Type: Diffusion Air valve: FUJIKIN Heater: D4EX05537 MFC, MFM: STEC Three phase power: 3Ø AC 200V Single phase power: 1Ø AC 100V Gas: N2 / SiH4 / Si2H6
    Configuration
    Process: POLY-Si The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )
    OEM Model Description
    "VERTRON-III(G) Model Numbers:DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."
    Documents

    No documents

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