Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX2000 Equipment status: Out of Fab Process: WELL (PYRO) HCl Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 3Ø AC 200V Single phase power: 1Ø AC 100V Main/APC: EC-5000 Gas: N2 / H2 / O2 / HCLConfiguration
Process: WELL (PYRO) HCl The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
"VERTRON-III(G) Model Numbers:DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."Documents
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KOKUSAI-ELECTRIC (KE)
DJ 833V
Verified
CATEGORY
Furnaces / Diffusion
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72843
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
2008
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KOKUSAI-ELECTRIC (KE)
DJ 833V
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: 27 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72843
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
2008
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX2000 Equipment status: Out of Fab Process: WELL (PYRO) HCl Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 3Ø AC 200V Single phase power: 1Ø AC 100V Main/APC: EC-5000 Gas: N2 / H2 / O2 / HCLConfiguration
Process: WELL (PYRO) HCl The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
"VERTRON-III(G) Model Numbers:DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."Documents
No documents
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