Description
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RLSA Chamber information : ESC for wafer with Dual He Cooling Nihon Koshuha Microwave Generator / Model is MKS 050B04C-OSC-V Turbo Pump:SHIMADZU / Model is FT2301D Generator Details: Top MKS-050B04 PS-V Bottom Daihen RGA-20C Gas Box Configuration : 1 N2 2 TSA 3 Ar 4 H2 5 NF3 6 SiH4OEM Model Description
Tactras™ is a 300mm plasma etch system that enhances etch process productivity. It provides customized solutions for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL dielectric etch. The common base product design allows Tactras™ to be built for specific applications. The etch chambers that can be installed on Tactras™ employ optimal design technologies to achieve excellent within-wafer uniformity, low wafer-to-wafer variation, and high selectivity in shaping the etch profile. Up to 6 chambers can be installed on Tactras™, each capable of handling different etch applications as required. Tactras™ offers operational advantages enabled by TEL’s cumulative knowhow on production technology, including a robust design to minimize machine-to-machine and chamber-to-chamber variation, particle reduction technology, unit-assembly inspection, and labor-saving automation. All of these contribute to customers’ productivity.Documents
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TEL / TOKYO ELECTRON
TACTRAS
Verified
CATEGORY
Plasma Etch
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
40071
Wafer Sizes:
12"/300mm
Vintage:
2012
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
TACTRAS
Verified
CATEGORY
Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
40071
Wafer Sizes:
12"/300mm
Vintage:
2012
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
RLSA Chamber information : ESC for wafer with Dual He Cooling Nihon Koshuha Microwave Generator / Model is MKS 050B04C-OSC-V Turbo Pump:SHIMADZU / Model is FT2301D Generator Details: Top MKS-050B04 PS-V Bottom Daihen RGA-20C Gas Box Configuration : 1 N2 2 TSA 3 Ar 4 H2 5 NF3 6 SiH4OEM Model Description
Tactras™ is a 300mm plasma etch system that enhances etch process productivity. It provides customized solutions for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL dielectric etch. The common base product design allows Tactras™ to be built for specific applications. The etch chambers that can be installed on Tactras™ employ optimal design technologies to achieve excellent within-wafer uniformity, low wafer-to-wafer variation, and high selectivity in shaping the etch profile. Up to 6 chambers can be installed on Tactras™, each capable of handling different etch applications as required. Tactras™ offers operational advantages enabled by TEL’s cumulative knowhow on production technology, including a robust design to minimize machine-to-machine and chamber-to-chamber variation, particle reduction technology, unit-assembly inspection, and labor-saving automation. All of these contribute to customers’ productivity.Documents
No documents