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PDC510

Category
Etch/Asher
Overview

Plasma Mode: RIE / DP mode changeable Electrode Structure: Parallel flat stage RF Power MAX.: 500W Oscillation Frequency: 13.56MHz Quartz Oscillator Display: LED touch panel Chamber Dimensions: W500 × D300 × H200mm Stage Size: W400 × D200mm Chamber Material: Aluminium Reaction Gas: 2 systems(Ar, O2) Purge Gas: N2 or Dry air Reaction Gas Flow Control: Mass flow controller

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