Description
No descriptionConfiguration
- It is configured for autoloading 200mm wafers - It has two process chambers: - CVE – XeF2 etch chamber (isotropic etching of Si) - CVD – oxide, nitride, and silicon - It does not have the Rapier chamber to run the DRIE Bosch process.OEM Model Description
Versalis fxP - a cluster system supporting a mixture of etch and deposition process chambers (up to 6 modules in total), useful for R&D or pilot production, saving both capital expenditure and cleanroom footprint. The fxP is an 8-sided cluster system supporting up to 6 process modules for the ultimate in throughput, availability and productivity.Documents
No documents
KLA / SPTS
VERSALIS fxP
Verified
CATEGORY
Etch/Asher
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
93301
Wafer Sizes:
8"/200mm
Vintage:
2018
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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View AllKLA / SPTS
VERSALIS fxP
Verified
CATEGORY
Etch/Asher
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
93301
Wafer Sizes:
8"/200mm
Vintage:
2018
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
- It is configured for autoloading 200mm wafers - It has two process chambers: - CVE – XeF2 etch chamber (isotropic etching of Si) - CVD – oxide, nitride, and silicon - It does not have the Rapier chamber to run the DRIE Bosch process.OEM Model Description
Versalis fxP - a cluster system supporting a mixture of etch and deposition process chambers (up to 6 modules in total), useful for R&D or pilot production, saving both capital expenditure and cleanroom footprint. The fxP is an 8-sided cluster system supporting up to 6 process modules for the ultimate in throughput, availability and productivity.Documents
No documents