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LAM RESEARCH CORPORATION 2300 EXELAN
    Description
    Dielectric Etch
    Configuration
    No Configuration
    OEM Model Description
    The 2300 Exelan is a dielectric etch system introduced in November 2000, designed to process both 200mm and 300mm wafers. It combines Dual Frequency Confined™ (DFC™) plasma technology with state-of-the-art chamber design to provide advanced process performance for copper conductive lines creation, latest generation insulating films, and high aspect ratio applications. It features the industry’s largest dielectric etch portfolio and is capable of meeting the challenges of new materials and reduced geometries at the 130nm technology node and below.
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    LAM RESEARCH CORPORATION

    2300 EXELAN

    verified-listing-icon

    Verified

    CATEGORY
    Etch/Asher

    Last Verified: 6 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    94618


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown

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    LAM RESEARCH CORPORATION 2300 EXELAN

    LAM RESEARCH CORPORATION

    2300 EXELAN

    Etch/Asher
    Vintage: 0Condition: Refurbished
    Last VerifiedOver 60 days ago

    LAM RESEARCH CORPORATION

    2300 EXELAN

    verified-listing-icon
    Verified
    CATEGORY
    Etch/Asher
    Last Verified: 6 days ago
    listing-photo-0c9e628f38b449e494b17c8fdc985b5b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    94618


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Dielectric Etch
    Configuration
    No Configuration
    OEM Model Description
    The 2300 Exelan is a dielectric etch system introduced in November 2000, designed to process both 200mm and 300mm wafers. It combines Dual Frequency Confined™ (DFC™) plasma technology with state-of-the-art chamber design to provide advanced process performance for copper conductive lines creation, latest generation insulating films, and high aspect ratio applications. It features the industry’s largest dielectric etch portfolio and is capable of meeting the challenges of new materials and reduced geometries at the 130nm technology node and below.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH CORPORATION 2300 EXELAN

    LAM RESEARCH CORPORATION

    2300 EXELAN

    Etch/AsherVintage: 0Condition: RefurbishedLast Verified: Over 60 days ago
    LAM RESEARCH CORPORATION 2300 EXELAN

    LAM RESEARCH CORPORATION

    2300 EXELAN

    Etch/AsherVintage: 0Condition: UsedLast Verified: 6 days ago
    LAM RESEARCH CORPORATION 2300 EXELAN

    LAM RESEARCH CORPORATION

    2300 EXELAN

    Etch/AsherVintage: 0Condition: UsedLast Verified: 6 days ago