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LAM RESEARCH / NOVELLUS SABRE
    Description
    ELECTROPLATER
    Configuration
    No Configuration
    OEM Model Description
    SABRE has been proven to provide void-free copper fill of sub-0.15 micron trench features (at 9 or 10:1 aspect ratios) and 0.25 micron vias (at 5:1 aspect ratios). SABRE employs a proprietary electrofilling cell that eliminates the backside wafer contamination of copper, and features a unique plating cell design that ensures reproducibility of the copper fill, with a film uniformity of 3 sigma, [5% with a wafer. SABRE requires only two types of process modules to complete the electrofill process, for electrofilling (3 stations total) and the other for spin/rinse/dry (another 3 stations). The resulting simplicity of this design is key to the system's high reliability and manufacturing availability.
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    LAM RESEARCH / NOVELLUS

    SABRE

    verified-listing-icon

    Verified

    CATEGORY

    Electro Plating
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    79961


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    LAM RESEARCH / NOVELLUS SABRE
    LAM RESEARCH / NOVELLUSSABREElectro Plating
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    LAM RESEARCH / NOVELLUS

    SABRE

    verified-listing-icon

    Verified

    CATEGORY

    Electro Plating
    Last Verified: Over 60 days ago
    listing-photo-ec35ce5e21e941fc8aa92c1cf187f6bb-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    79961


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    ELECTROPLATER
    Configuration
    No Configuration
    OEM Model Description
    SABRE has been proven to provide void-free copper fill of sub-0.15 micron trench features (at 9 or 10:1 aspect ratios) and 0.25 micron vias (at 5:1 aspect ratios). SABRE employs a proprietary electrofilling cell that eliminates the backside wafer contamination of copper, and features a unique plating cell design that ensures reproducibility of the copper fill, with a film uniformity of 3 sigma, [5% with a wafer. SABRE requires only two types of process modules to complete the electrofill process, for electrofilling (3 stations total) and the other for spin/rinse/dry (another 3 stations). The resulting simplicity of this design is key to the system's high reliability and manufacturing availability.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS SABRE
    LAM RESEARCH / NOVELLUS
    SABRE
    Electro PlatingVintage: 0Condition: UsedLast Verified: Over 30 days ago
    LAM RESEARCH / NOVELLUS SABRE
    LAM RESEARCH / NOVELLUS
    SABRE
    Electro PlatingVintage: 0Condition: UsedLast Verified: Over 30 days ago
    LAM RESEARCH / NOVELLUS SABRE
    LAM RESEARCH / NOVELLUS
    SABRE
    Electro PlatingVintage: 0Condition: UsedLast Verified: Over 60 days ago