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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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TEL / TOKYO ELECTRON UNITY IIE 855SS
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The UNITY® IIe is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, which also includes the M and Me models, each designed for specific applications to achieve higher productivity and reliability. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM™ chambers, and is available in 84, 85 and 88 models. The system boasts high throughput, a compact design, lower CoO, and ease of maintenance. The Me model also includes a Flow Control System. With its advanced features and capabilities, the UNITY® IIe is a powerful tool for achieving optimal process results.
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    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    102752


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON UNITY IIE 855SS

    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    Dry / Plasma Etch
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: Over 60 days ago
    listing-photo-86e09df8d43e4d9e8f08df7a2badc35b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    102752


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The UNITY® IIe is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, which also includes the M and Me models, each designed for specific applications to achieve higher productivity and reliability. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM™ chambers, and is available in 84, 85 and 88 models. The system boasts high throughput, a compact design, lower CoO, and ease of maintenance. The Me model also includes a Flow Control System. With its advanced features and capabilities, the UNITY® IIe is a powerful tool for achieving optimal process results.
    Documents

    No documents

    Similar Listings
    View All
    TEL / TOKYO ELECTRON UNITY IIE 855SS

    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON UNITY IIE 855SS

    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON UNITY IIE 855SS

    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    Dry / Plasma EtchVintage: 2006Condition: UsedLast Verified:Over 60 days ago