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TEL VIGUS PK2 OxideOEM Model Description
Tactras™ Vigus™ is a highly reliable 300mm plasma etch system that enhances etch process productivity. It provides customized options for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL. The system is designed to deliver excellent wafer uniformity, low wafer-to-wafer variation, and high selectivity for thin film stop layers while maintaining a high etch rate. Up to 6 Vigus™ chambers can be installed on the Tactras™ platform. Tactras™ Vigus™ contributes to maximizing productivity for semiconductor manufacturers with industry-leading tool availability by minimizing offset in machine-to-machine and chamber-to-chamber with robust design, particle reduction techniques, introducing unit-assembly inspection method before shipment, and unique labor-saving automated functions. Overall, Tactras™ Vigus™ is a highly efficient and versatile etching system that offers many benefits to its users.Documents
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TEL / TOKYO ELECTRON
TACTRAS VIGUS
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117104
Wafer Sizes:
12"/300mm
Vintage:
2013
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
TACTRAS VIGUS
CATEGORY
Dry / Plasma Etch
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117104
Wafer Sizes:
12"/300mm
Vintage:
2013
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
TEL VIGUS PK2 OxideOEM Model Description
Tactras™ Vigus™ is a highly reliable 300mm plasma etch system that enhances etch process productivity. It provides customized options for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL. The system is designed to deliver excellent wafer uniformity, low wafer-to-wafer variation, and high selectivity for thin film stop layers while maintaining a high etch rate. Up to 6 Vigus™ chambers can be installed on the Tactras™ platform. Tactras™ Vigus™ contributes to maximizing productivity for semiconductor manufacturers with industry-leading tool availability by minimizing offset in machine-to-machine and chamber-to-chamber with robust design, particle reduction techniques, introducing unit-assembly inspection method before shipment, and unique labor-saving automated functions. Overall, Tactras™ Vigus™ is a highly efficient and versatile etching system that offers many benefits to its users.Documents
No documents