Description

No description

Configuration

Lam 9600 Information Configured for 200mm / 8” wafers Envision software Hine Cassette indexer load / unload Entrance Loadlock Main chamber  Bottom Actuated Clamping system  Adixen Alacatel ATH 1300 turbo pump  VAT 65  Gas box configured for 6 gases  RPG 1250 RF generators DSQ / Exit load lock  Configured for 3 gases  WVDS  Heated paddle  APM – atmospheric passivation module Remote AC Panel System is currently installed

OEM Model Description

TCP 9600 is a high-density, low-pressure system from Lam’s TCP product line. It was introduced in late 1992 and incorporates the Company’s patented Transformer Coupled Plasma-TM- source technology for etching 0.35 micron and smaller geometries. The TCP 9600 series is designed for metal etch applications and is used to produce a broad range of advanced logic and memory devices. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates, with independent power control to the lower electrode. This improves etch results across a wider process window and offers customers a reliable, lower cost of ownership solution to their advanced needs.

Documents

LAM RESEARCH CORPORATION TCP 9600.pdf

LAM RESEARCH CORPORATION

TCP 9600

Verified

Dry / Plasma Etch

Last Verified: 24 days ago

Key Item Details

Condition:

Used

Operational Status:

Installed / Running

Product ID:

145106

Wafer Sizes:

8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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