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LAM RESEARCH CORPORATION 2300 VERSYS STAR
    Description
    Etch / ashing system
    Configuration
    MW chamber
    OEM Model Description
    Lam’s 2300 Versys Star silicon etch system is designed to meet the challenging needs of sub-90-nm technologies. It delivers superior performance on complex film stacks and meets the requirements for next-generation silicon etch processes to sub-65 nm. The system provides excellent CD bias uniformity, enabled by the industry’s first technologies for tuning gas flows and wafer temperature with step-by-step settings. This allows flexibility in designing the process across the wafer and between steps, leading to a larger process window that can accommodate an extensive variety of applications, wafer types, and film types. The 2300 Versys Star is available as an upgrade to existing 2300 Versys systems.
    Documents

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    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: 13 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    152699


    Wafer Sizes:

    12"/300mm


    Vintage:

    2004


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    LAM RESEARCH CORPORATION 2300 VERSYS STAR

    LAM RESEARCH CORPORATION

    2300 VERSYS STAR

    Dry / Plasma Etch
    Vintage: 2004Condition: Used
    Last Verified13 days ago

    LAM RESEARCH CORPORATION

    2300 VERSYS STAR

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: 13 days ago
    listing-photo-ec0cd99c6c6f4fe7affeecd53bed76cb-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    152699


    Wafer Sizes:

    12"/300mm


    Vintage:

    2004


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Etch / ashing system
    Configuration
    MW chamber
    OEM Model Description
    Lam’s 2300 Versys Star silicon etch system is designed to meet the challenging needs of sub-90-nm technologies. It delivers superior performance on complex film stacks and meets the requirements for next-generation silicon etch processes to sub-65 nm. The system provides excellent CD bias uniformity, enabled by the industry’s first technologies for tuning gas flows and wafer temperature with step-by-step settings. This allows flexibility in designing the process across the wafer and between steps, leading to a larger process window that can accommodate an extensive variety of applications, wafer types, and film types. The 2300 Versys Star is available as an upgrade to existing 2300 Versys systems.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH CORPORATION 2300 VERSYS STAR

    LAM RESEARCH CORPORATION

    2300 VERSYS STAR

    Dry / Plasma EtchVintage: 2004Condition: UsedLast Verified:13 days ago