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LAM RESEARCH CORPORATION 2300 VERSYS KIYO
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO
Description
No description
Configuration
Process Capabilities : Plasma Etch Chamber 1 Description : dual zone ESC Controller Type : VME Temperature Control : Single Pyrometer External Cooling : Water Cooled Accessories Rocker Valve for Installation on V2 Mainframe 16 Slot Gasbox Power Requirements : 100-240 V 41.0 A 50/60 Hz Cooling Water Required : Minimum Temperature: 10 ºC (50 ºF, 283.00 ºK) Maximum Temperature: 50 ºC (122 ºF, 323 ºK)
OEM Model Description
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.
Documents

No documents

PREFERRED
 
SELLER
CATEGORY
Dry / Plasma Etch

Last Verified: 5 days ago

Buyer pays 12% premium of final sale price
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

125819


Wafer Sizes:

8"/200mm


Vintage:

2008


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

LAM RESEARCH CORPORATION

2300 VERSYS KIYO

verified-listing-icon
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: 5 days ago
listing-photo-ac40e3e0aacb4a1dbe68f5020717f198-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1710/ac40e3e0aacb4a1dbe68f5020717f198/29f76128836a4acabaa47ee7309cdd3d_396c2c61f27b48889de9307cc35cbf8f1201a_mw.jpeg
listing-photo-ac40e3e0aacb4a1dbe68f5020717f198-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1710/ac40e3e0aacb4a1dbe68f5020717f198/d13806bf6749424b9c04dd010fa9ef31_92118177683648eb90c99ddb825dd17b1201a_mw.jpeg
listing-photo-ac40e3e0aacb4a1dbe68f5020717f198-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1710/ac40e3e0aacb4a1dbe68f5020717f198/8bca4db2fce74fd3b538f3f3b0d38742_51fbcf8007e545aa9db400bae27ce75c1201a_mw.jpeg
listing-photo-ac40e3e0aacb4a1dbe68f5020717f198-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1710/ac40e3e0aacb4a1dbe68f5020717f198/ba93ef05530741588257446d362ecc71_08fed8cdf41444c9a3a4db5c58a2b85b1201a_mw.jpeg
Buyer pays 12% premium of final sale price
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

125819


Wafer Sizes:

8"/200mm


Vintage:

2008


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
Process Capabilities : Plasma Etch Chamber 1 Description : dual zone ESC Controller Type : VME Temperature Control : Single Pyrometer External Cooling : Water Cooled Accessories Rocker Valve for Installation on V2 Mainframe 16 Slot Gasbox Power Requirements : 100-240 V 41.0 A 50/60 Hz Cooling Water Required : Minimum Temperature: 10 ºC (50 ºF, 283.00 ºK) Maximum Temperature: 50 ºC (122 ºF, 323 ºK)
OEM Model Description
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.
Documents

No documents