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Description
Complete systemConfiguration
•Polysilicon: 490 •Wafer size: 6 inch •Upgraded TFT monitors •Wafer detection •Incl maintenance console •Conditon: AS IS (No Chiller, No pump but with ENI RF Generator) Features: •Single-wafer processing •Fully automated microprocessor control •Cassette-to-cassette wafer processing •Vacuum load locked •Programmable, variable electrode spacing •Endpoint detection •Configurable for 3-inch to 6-inch wafers •Stand-alone or bulk-head mount configurationOEM Model Description
The AutoEtch 490 is part of the AutoEtch family, which was Lam’s initial product line. The first AutoEtch product was sold in January 1982. The AutoEtch product line includes the 490, 590, and 690 series for etching polysilicon, oxide, and aluminum film applications, respectively. Despite being more than fourteen years old, continued improvements in both reliability and performance have enabled Lam to continue to offer the AutoEtch series as a suitable product for film applications involving line-widths of 0.8 micron or greater and wafer sizes of six inches or smaller.Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65309
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
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LAM RESEARCH CORPORATION
AUTOETCH 490
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65309
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Complete systemConfiguration
•Polysilicon: 490 •Wafer size: 6 inch •Upgraded TFT monitors •Wafer detection •Incl maintenance console •Conditon: AS IS (No Chiller, No pump but with ENI RF Generator) Features: •Single-wafer processing •Fully automated microprocessor control •Cassette-to-cassette wafer processing •Vacuum load locked •Programmable, variable electrode spacing •Endpoint detection •Configurable for 3-inch to 6-inch wafers •Stand-alone or bulk-head mount configurationOEM Model Description
The AutoEtch 490 is part of the AutoEtch family, which was Lam’s initial product line. The first AutoEtch product was sold in January 1982. The AutoEtch product line includes the 490, 590, and 690 series for etching polysilicon, oxide, and aluminum film applications, respectively. Despite being more than fourteen years old, continued improvements in both reliability and performance have enabled Lam to continue to offer the AutoEtch series as a suitable product for film applications involving line-widths of 0.8 micron or greater and wafer sizes of six inches or smaller.Documents
No documents
Similar Listings
View AllLAM RESEARCH CORPORATION
AUTOETCH 490
Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days agoLAM RESEARCH CORPORATION
AUTOETCH 490
Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days agoLAM RESEARCH CORPORATION
AUTOETCH 490
Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days agoLAM RESEARCH CORPORATION
AUTOETCH 490
Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days agoLAM RESEARCH CORPORATION
AUTOETCH 490
Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days agoLAM RESEARCH CORPORATION
AUTOETCH 490
Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days agoLAM RESEARCH CORPORATION
AUTOETCH 490
Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days agoPREFERRED