Description
FurnaceConfiguration
No ConfigurationOEM Model Description
The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.Documents
No documents
TEL / TOKYO ELECTRON
TELINDY
Verified
CATEGORY
Furnaces / Diffusion
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
22671
Wafer Sizes:
Unknown
Vintage:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
TEL / TOKYO ELECTRON
TELINDY
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
22671
Wafer Sizes:
Unknown
Vintage:
2007
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
FurnaceConfiguration
No ConfigurationOEM Model Description
The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.Documents
No documents
Similar Listings
View AllTEL / TOKYO ELECTRON
TELINDY
Furnaces / DiffusionVintage: 2006Condition: UsedLast Verified: 27 days agoTEL / TOKYO ELECTRON
TELINDY
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 30 days agoTEL / TOKYO ELECTRON
TELINDY
Furnaces / DiffusionVintage: 2005Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
TELINDY
Furnaces / DiffusionVintage: 2007Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON
TELINDY
Furnaces / DiffusionVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON