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TEL / TOKYO ELECTRON TELINDY
    Description
    Tel Indy IRAD
    Configuration
    Asset Description: TEL Furnace Software Version: 6.01 CIM: secs-gem Process: MLD Nitride Main System: Tel Indy Mainframe (1) Factory Interface: FOUP (2) Options System: Gas Detector box (1) Options System: RCU (Rapid Cooling Unit) (1) 208VAC UPS (1) Rapid cooling unit (1)
    OEM Model Description
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    Documents

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    111985


    Wafer Sizes:

    12"/300mm


    Vintage:

    2008


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion
    Vintage: 2010Condition: Used
    Last Verified8 days ago

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: Over 60 days ago
    listing-photo-87228f4a4a6a4f81ba78e5922d3f2c07-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/87228f4a4a6a4f81ba78e5922d3f2c07/50b1cdded4584353b66c557a2d2cf922_066f766655424560958da9262ce92fe745005c_mw.jpeg
    listing-photo-87228f4a4a6a4f81ba78e5922d3f2c07-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/87228f4a4a6a4f81ba78e5922d3f2c07/29f5b225790845ada046a4ff211bea22_c09c6b7b559c4110b32a624901e021551201a_mw.jpeg
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    listing-photo-87228f4a4a6a4f81ba78e5922d3f2c07-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/87228f4a4a6a4f81ba78e5922d3f2c07/7fda3d05348d49d2b59441b56b39e5b2_738b1f534131437b909957aed25d7fcb1201a_mw.jpeg
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    listing-photo-87228f4a4a6a4f81ba78e5922d3f2c07-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/87228f4a4a6a4f81ba78e5922d3f2c07/40b609a9afe34acd8d9c4ba57dbe3da9_459a32df7b594822836f9738f4349b001201a_mw.jpeg
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    listing-photo-87228f4a4a6a4f81ba78e5922d3f2c07-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/87228f4a4a6a4f81ba78e5922d3f2c07/6f1cb25797814606b4f0012da0b9f657_3e54ec3629404e83b3d35fea059ee23b45005c_mw.jpeg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    111985


    Wafer Sizes:

    12"/300mm


    Vintage:

    2008


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Tel Indy IRAD
    Configuration
    Asset Description: TEL Furnace Software Version: 6.01 CIM: secs-gem Process: MLD Nitride Main System: Tel Indy Mainframe (1) Factory Interface: FOUP (2) Options System: Gas Detector box (1) Options System: RCU (Rapid Cooling Unit) (1) 208VAC UPS (1) Rapid cooling unit (1)
    OEM Model Description
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    Documents
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

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    TEL / TOKYO ELECTRON TELINDY

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    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

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    Furnaces / DiffusionVintage: 2010Condition: UsedLast Verified:Over 60 days ago