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TEL / TOKYO ELECTRON TELINDY
    Description
    Tel Indy IRAD
    Configuration
    Asset Description: TEL Furnace Software Version: 6.01 CIM: secs-gem Process: MLD Nitride Main System: Tel Indy Mainframe (1) Factory Interface: FOUP (2) Options System: Gas Detector box (1) Options System: RCU (Rapid Cooling Unit) (1) 208VAC UPS (1) Rapid cooling unit (1)
    OEM Model Description
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    Documents

    No documents

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    103932


    Wafer Sizes:

    12"/300mm


    Vintage:

    2008


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    TEL / TOKYO ELECTRON TELINDY

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    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: Over 60 days ago
    listing-photo-a01c0788b7564fca86c85a646f011845-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a01c0788b7564fca86c85a646f011845/eb860f5600f54df9b501f572b5f4dfee_0a7cb393b5f848378935ee12a6557e831201a_mw.jpeg
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    listing-photo-a01c0788b7564fca86c85a646f011845-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a01c0788b7564fca86c85a646f011845/bc6c2476ce894f02868b00a14a572915_e1076cfa9bfa49728b08ab47ceca39fe1201a_mw.jpeg
    listing-photo-a01c0788b7564fca86c85a646f011845-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a01c0788b7564fca86c85a646f011845/396823670b79436db80664c6155b819a_31d320ddf9e04e1182240c680254dfa61201a_mw.jpeg
    listing-photo-a01c0788b7564fca86c85a646f011845-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a01c0788b7564fca86c85a646f011845/0be69fbcd275495ea05f32e9428f0fd9_56cf60a02ec24b23a299b6753d530bbc1201a_mw.jpeg
    listing-photo-a01c0788b7564fca86c85a646f011845-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a01c0788b7564fca86c85a646f011845/42d8d1d369e84fedb92d47eaddab6467_4ec3913f65d344a48da72a38ed5c49a2_mw.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    103932


    Wafer Sizes:

    12"/300mm


    Vintage:

    2008


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Tel Indy IRAD
    Configuration
    Asset Description: TEL Furnace Software Version: 6.01 CIM: secs-gem Process: MLD Nitride Main System: Tel Indy Mainframe (1) Factory Interface: FOUP (2) Options System: Gas Detector box (1) Options System: RCU (Rapid Cooling Unit) (1) 208VAC UPS (1) Rapid cooling unit (1)
    OEM Model Description
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    Documents

    No documents

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    View All
    TEL / TOKYO ELECTRON TELINDY

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    TEL / TOKYO ELECTRON TELINDY

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