TELFORMULA
Diffusion and Oxidation Furnaces
TELFORMULA™ is the semiconductor industry’s most advanced iso-thermal minibatch platform. TELFORMULA™ incorporates a number of innovative technologies specifically developed to address the industry’s need for a 300mm high speed batch platform capable of delivering short TAT (Turn Around Time) both suitable for product development and simultaneously capable of meeting demanding, high-volume production requirements. TELFORMULA™ is the ideal platform for a wide variety of semiconductor processes including LPCVD Si (Poly, a-Si), Si3N4, SiO2, ALD High-k, ATM/LP Oxidation, Oxynitridation, etc.
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Diffusion and Oxidation Furnaces
Diffusion and Oxidation Furnaces
Diffusion and Oxidation Furnaces
Diffusion and Oxidation Furnaces
Diffusion and Oxidation Furnaces
Diffusion and Oxidation Furnaces
Diffusion and Oxidation Furnaces
Diffusion and Oxidation Furnaces