Description
CVD systemConfiguration
Known issues: Not included: Chamber Gate Valve; MFC7; (Qty 2) LM-Arm End Effector Pads (Rear); (Qty 2) Chamber APC Valve; LM-Robot (Front-End); (Qty 3) Process Kit; (Qty 2) LM-Arm End Effector Pads (Front); Chemgaurd ClF3 Cabinet; (Qty 3) Chamber Trap Trias Mainframe (Qty 3) EXII Chamber FOUP Factory Interface Yaskawa Dual Arm Handler Process: TiN Software Version: V5 750R1 CIM: SECS/GEMOEM Model Description
Triase+™ Ti/TiN is a 300mm single-wafer metal CVD system for high step coverage Ti/TiN film formation using TiCl4.Documents
No documents
CATEGORY
Deposition
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154819
Wafer Sizes:
12"/300mm
Vintage:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
TRIASe+ Ti/TiN
CATEGORY
Deposition
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154819
Wafer Sizes:
12"/300mm
Vintage:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
CVD systemConfiguration
Known issues: Not included: Chamber Gate Valve; MFC7; (Qty 2) LM-Arm End Effector Pads (Rear); (Qty 2) Chamber APC Valve; LM-Robot (Front-End); (Qty 3) Process Kit; (Qty 2) LM-Arm End Effector Pads (Front); Chemgaurd ClF3 Cabinet; (Qty 3) Chamber Trap Trias Mainframe (Qty 3) EXII Chamber FOUP Factory Interface Yaskawa Dual Arm Handler Process: TiN Software Version: V5 750R1 CIM: SECS/GEMOEM Model Description
Triase+™ Ti/TiN is a 300mm single-wafer metal CVD system for high step coverage Ti/TiN film formation using TiCl4.Documents
No documents