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6" Fab For Sale from Moov - Click Here to Learn More
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LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS
    Description
    No description
    Configuration
    WCVD
    OEM Model Description
    Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
    Documents

    No documents

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    verified-listing-icon

    Verified

    CATEGORY
    Deposition

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    107438


    Wafer Sizes:

    12"/300mm


    Vintage:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Deposition
    Vintage: 2009Condition: Used
    Last Verified6 days ago

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    verified-listing-icon
    Verified
    CATEGORY
    Deposition
    Last Verified: Over 60 days ago
    listing-photo-a93458886a654a6588d39bd2a366fb08-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    107438


    Wafer Sizes:

    12"/300mm


    Vintage:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    WCVD
    OEM Model Description
    Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    DepositionVintage: 2009Condition: UsedLast Verified:6 days ago
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    DepositionVintage: 2003Condition: UsedLast Verified:6 days ago
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    DepositionVintage: 2006Condition: UsedLast Verified:Over 60 days ago