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KLA 2800
    Description
    KLA2800 Lamp
    Configuration
    No Configuration
    OEM Model Description
    The 2800 Series is a next-generation broadband DUV/UV/VIS patterned wafer inspection platform for sub-65-nm design rule development and production. It delivers maximum sensitivity, 2X better throughput than previous-generation DUV tools, and has a roadmap that extends to 45-nm and beyond design rules. It offers an array of optical modes and accelerates time to results with advanced binning and realtime defect classification. The 2800 Series is suited for unique applications such as Photo Cell Monitoring, Process Window Qualification, and Micro After-Develop Inspection. It complements the Puma 9000 Series darkfield platform and eS3x electron-beam inspection system to enable a comprehensive defect inspection strategy.
    Documents

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    KLA

    2800

    verified-listing-icon

    Verified

    CATEGORY

    Defect Inspection
    Last Verified: Over 30 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    101300

    Wafer Sizes:

    12"/300mm

    Vintage:

    Unknown

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    KLA 2800
    KLA2800Defect Inspection
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    KLA

    2800

    verified-listing-icon

    Verified

    CATEGORY

    Defect Inspection
    Last Verified: Over 30 days ago
    listing-photo-7b4aeb4b4ac040f7a5eb3f9fc9d59386-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    101300

    Wafer Sizes:

    12"/300mm

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    KLA2800 Lamp
    Configuration
    No Configuration
    OEM Model Description
    The 2800 Series is a next-generation broadband DUV/UV/VIS patterned wafer inspection platform for sub-65-nm design rule development and production. It delivers maximum sensitivity, 2X better throughput than previous-generation DUV tools, and has a roadmap that extends to 45-nm and beyond design rules. It offers an array of optical modes and accelerates time to results with advanced binning and realtime defect classification. The 2800 Series is suited for unique applications such as Photo Cell Monitoring, Process Window Qualification, and Micro After-Develop Inspection. It complements the Puma 9000 Series darkfield platform and eS3x electron-beam inspection system to enable a comprehensive defect inspection strategy.
    Documents

    No documents

    Similar Listings
    View All
    KLA 2800
    KLA
    2800
    Defect InspectionVintage: 0Condition: UsedLast Verified: Over 30 days ago